Semiconductor process equipments developer, Veeco Instruments, has announced the release of its Lumina Metal Organic Chemical Vapor Deposition (MOCVD) platform, which incorporates the proprietary TurboDisc reactor technology for outstanding film uniformity, yield and device performance for a variety of photonics applications. This new MOCVD platform, including the Lumina R480 and Lumina R480S models, will accelerate the production of VCSEL, Edge-Emitting Laser (EEL) and Mini / Micro LED devices.
In response to strong consumer demand for arsenic phosphide (As/P) MOCVD technology, the Lumina platform is advancing a new generation of high-efficiency photonics devices including VCSELs used in 3D sensing, autonomous driving and high-speed data communication. The Lumina platform is also designed for mini and micro LED production for advanced displays found in next-generation 4K and 8K televisions, smartphones and wearable devices, as well as EEL devices used for advanced optical communications and silicon photonics applications.
The Lumina R480 and R480S systems are based on Veeco’s industry leading MOCVD TurboDisc technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to six inches in diameter. The Lumina platform allows users to customize their systems for maximum value.