Thin Substrate, Dichroic and Polychroic Thin Film Filters Featuring Flatness less than Zero Point 1 Waves RMS

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Alluxa is introducing a new line of thin substrate ultra-flat dichroics and polychroic filters for use in imaging applications that require flatness levels exceeding 0.1 waves RMS per inch. These filters are unique because they achieve flatness by eliminating the high stresses of as-deposited traditional ion-based coating process such as Ion Beam Sputtering (IBS) and Ion Assisted Deposition (IAD).