The FemtoLux 30 from EKSPLA is a Femtosecond Laser that operates at wavelengths of 1030 nm, 515 nm, or 343 nm. It delivers an output power of 30 W (at 1030 nm), 11 W (at 515 nm) & 6 W (at 343 nm) and has a pulse energy of up to 90 µJ (at 1030 nm), 55 µJ (at 515 nm), and 30 µJ (at 343 nm). This laser has a pulse energy stability of 1 % and pulse repetition rate of 200 kHz - 400 MHz. It has a pulse duration (FWHM) of 350 fs - 1 ps and long-term power stability of 0.5 %. This laser produces a beam of diameter 2.5 ± 0.4 mm and has a beam divergence of less than 1 mrad. It has a beam pointing thermal stability (RMS) of less than 20 µrad/°C, beam circularity above 0.85, and beam quality factor (M2) of 1.1.
The FemtoLux 30 has internal/external triggering modes and pulse output controls such as a frequency divider, pulse picker, burst mode, packet triggering, power attenuation, and pulse-on-demand. This laser can be controlled via RS232 or LAN interfaces. It requires an AC supply voltage of 100 - 240 V and is available in a benchtop package that measures 569 mm x 429 mm x 130 mm (laser head) & 449 mm x 376 mm x 177 mm (power supply unit). This laser is ideal for glass, sapphire & ceramics micro-processing, microelectronics manufacturing, glass intra-volume structuring, micro-processing of different polymers & metals, LCD, LED, OLED drilling, cutting & repair applications.
