The SPIE Photomask Technology + EUV Lithography 2026 will take place from September 8 to 11, 2026, at the Monterey Conference Center in Monterey, California, USA. The conference is a leading international event focused on photomask technology, extreme ultraviolet (EUV) lithography, patterning, metrology, and semiconductor manufacturing technologies, bringing together researchers, engineers, scientists, and industry professionals from across the global semiconductor and photonics industries. Attendees will have the opportunity to explore the latest advancements in EUV lithography, mask inspection and repair, resist materials, nanoimprint technologies, semiconductor metrology, and next-generation chip fabrication through technical conferences, exhibitions, presentations, and networking sessions.