The SPIE Advanced Lithography + Patterning will take place in San Jose, California, United States from 25th February to 29th February, 2024. This conference is a meeting place for leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. It offers numerous opportunities for students to engage and learn about the semiconductor industry, as well as share their latest research in lithography and photomask technologies.