SPIE Photomask Technology + Extreme Ultraviolet Lithography 2022

  • Date: 25 to 29 September, 2022
  • Location: Monterey, California, United States
  • Event Type: Conference, Meeting, Exhibition

Event Overview

The SPIE Photomask Technology + Extreme Ultraviolet Lithography 2022 will be held from 25th September to 29th September 2022 in Monterey, California, United States. It is a premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies. This meeting includes talking with scientists and engineers to share spontaneous ideas. It also includes a discussion of product requirements with top optics and photonics suppliers at the free two-day exhibition. Participants could meet industry partners who can help solve problems, cut costs, and increase their capabilities.