Astrella HE F

Optical Amplifier by Coherent Corp.

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The Astrella HE F from Coherent Corp. is an Ultrafast Ti:Sapphire Fiber Optic Amplifier that operates at a wavelength of 780 nm - 820 nm. It has a power stability of up to 0.5 rms and pulse energy above 9 mJ (at 1 kHz) & 2 mJ (at 5 kHz). This linearly or horizontally polarized fiber optic amplifier has a TEM00 spatial mode and beam quality factor (M2below 1.25. It produces a beam of diameter 13 mm (at 1 kHz) & 11 mm (at 5 kHz) and has a pointing stability of up to 10 μrad. This fiber optic amplifier has a repetition rate of 1 kHz & 5 kHz and pulse duration of less than 60 fs, 80 fs, & 100 fs (at FWHM).

The Astrella HE F uses Revolution-80 pump laser and Vitara-S, Vitara-T, or Vitara-T-HP seed lasers. It has a contrast ratio above 1000:1 (pre-pulse) & 100:1 (post-pulse) and is HASS (Highly Accelerated Stress Screening) verified. This optical amplifier has a hands-free Vitara oscillator and STAR regenerative amplifier. It is available in a package that measures 1247 mm x 1213 mm x 262 mm and is ideal for time-resolved spectroscopy, multidimensional spectroscopy, THz spectroscopy, fs micromachining, surface SFG/SHG, stimulated Raman scattering, high harmonic generation & EUV spectroscopy applications.

Product Specifications

Product Details

  • Part Number
    Astrella HE F
  • Manufacturer
    Coherent Corp.
  • Description
    780 nm - 820 nm, Ti:Sapphire Amplifier for EUV Spectroscopy Applications

General Parameters

  • Amplifier Type
    Ultrafast Amplifier
  • Beam Diameter
    11 to 13 mm
  • Beam Quality Factor (M2)
    <1.25
  • Output Type
    Pulsed
  • Center Wavelength
    780 to 820 nm
  • Package Type
    Benchtop / Rackmount
  • Polarization
    Linear, Horizontal
  • Contrast Ratio
    >1000:1 (Pre), >100:1 (Post)
  • Output Power Stability
    <0.5 rms
  • Package
    Benchtop
  • Pulse Energy
    >2 to 9 mJ
  • Pulse Width
    <60 to 100 fs
  • Repetition Rate
    1.5 kHz

Applications

  • Application
    Time-resolved Spectroscopy, Multidimensional Spectroscopy, THz Spectroscopy, fs Micromachining, Surface SFG/SHG, Stimulated Raman Scattering, High Harmonic Generation, EUV Spectroscopy

Technical Documents

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