The new generation of the Pulsed-DC power supplies TruPlasma DC 4000 G2 is a smart combination of TRUMPF Huettinger experience in DC and Pulsed-DC power delivery. For the first time one unit can be used as a magnetron power supply or substrate bias power supply. At the same time all advanced functionalities such as wide frequency and duty cycle settings or highly effective arc suppression are available to the user independently whether the unit is used to deliver required power to magnetron or substrate bias. Therefore, these units are not only an interesting alternative for process engineers as a tool to enhance the stability of the process (elimination of arcing) or improve the production yield (wide range of operation settings). Dual usability of TruPlasma DC 4000 G2 is also an interesting product for investors to reduce cost of ownership by unification of used power supply types on plasma systems.