White Paper : Wire Grid Polarizers using Nanoimprint Lithography
Nanoimprint technology has been attracting attention as an inexpensive lithography technology that can form 10nm-level patterns on a wide range of substrate materials such as glass and resin. In recent years, it has become an essential technology for manufacturing nanophotonics optical devices that require particularly high environmental resistance, such as mobile devices, displays, automated driving, robotics, security, and AR (augmented reality). The wire-grid polarizers discussed in this paper are inorganic polarizers consisting of metal line and space patterns of several tens of nanometers formed on a transparent substrate.
