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Advanced nanostructure fabrication with the Skylark 349 NX DPSS laser

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Advanced nanostructure fabrication with the Skylark 349 NX DPSS laser

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  • Author: Dr. Bodo Fuhrmann
At the Interdisciplinary Centre for Materials Science (IZM) cleanroom at Martin Luther University Halle, a lithography setup using a 50 mW 266 nm laser has been in operation for some time. This setup is primarily used to produce regular nanostructures with periods ranging from approximately 150 nm to 650 nm using Lloyd's interferometers, and periods greater than 1 μm with Fresnel interferometers. However, a notable gap exists in the ability to produce structures with periods between 650 nm and 1000 nm. Additionally, the range of available photoresists compatible with the 266 nm wavelength is limited, with only two resists proving effective at the IZM so far: the AR-N4240 from Allresist (negative) and the MIR701 from Microchemicals (positive).

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