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High-Throughput Photoresist Strip Using a Toroidal RF Plasma Source in Ashers

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High-Throughput Photoresist Strip Using a Toroidal RF Plasma Source in Ashers

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The relative simplicity and high performance of remote toroidal RF plasma sources offer a number of process and integration advantages in advanced high-throughput photoresist strip. These sources are proven, robust technologies. Remote toroidal RF sources deliver much higher concentrations of reactive neutrals to the wafer surface than do conventional microwave sources and display strip rates that are at least 2 to 3 times greater than those possible using the microwave sources. This increase in strip rate is accomplished without any increase in plasma damage to the substrate.

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