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Semiconductor Etching

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Semiconductor Etching

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In semiconductor device fabrication, etching refers to any technology that will selectively remove material from a thin film on a substrate (with or without prior structures on its surface) and by this removal create a pattern of that material on the substrate. The pattern is defined by a mask that is resistant to the etching process, the creation of which was described in detail in Photolithography. Once the mask is in place, etching of the material that is not protected by the mask can occur, by either wet chemical or by "dry" physical methods.

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