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Wet Substrate Surface Cleaning

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Wet Substrate Surface Cleaning

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Wet chemical cleaning and conditioning of wafer surfaces is a critical process step in most, if not all, semiconductor device fabrication schemes. The acidic cleans listed above have a long history of use in semiconductor processing; forecasts call for their continued use into the foreseeable future. The chemical composition, actions and process applications of these wet cleaning methods are covered in Wafer Surface Cleaning.

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