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Dry Substrate Surface Cleaning

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Dry Substrate Surface Cleaning

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"Dry" substrate cleaning refers to processes in which reactive, unstable ions and/or radicals are created in a plasma, directed to a substrate surface and there allowed to react with contaminants on the surface to produce volatile products that can be pumped away. In this way, contaminants such as organic material can be removed from the substrate surface. The most common application for dry substrate cleaning is photoresist stripping and "descum" steps. Photoresist stripping involves the removal of photoresist residues by reaction with atomic oxygen radicals or some other highly reactive species to produce a volatile product that can be pumped away by the vacuum system.

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