1.  Home
  2. Whitepapers
  3. Thermal Annealing

Thermal Annealing

Download Whitepaper

Thermal Annealing

Download Whitepaper
Conventional, high-temperature annealing is used in device manufacturing to relieve stress in silicon; to activate ion-implanted dopants and to reduce structural defects and stress; and to reduce interfacial charge at the silicon-silicon dioxide interface. There are also lower temperature annealing processes that may not be referred to as such. Some other heat treatment processes are occasionally referred to as annealing. These include glass densification, polysilicon and doped polysilicon anneal, silicide formation and contact sintering.

Download Whitepaper Now