Ultrafast Coherent EUV at 25-50 nm using the KMLabs XUUS4™ with the Coherent Astrella®

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Ultrafast Coherent EUV at 25-50 nm using the KMLabs XUUS4™ with the Coherent Astrella®

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  • Author: Xiaoshi Zhang, Eric Mountford, Matthew Kirchner, and Henry Kapteyn
Just as the invention of the laser has revolutionized science and technology in recent decades, the recent development of tabletop-scale coherent laser sources at much shorter wavelengths, EUV, and soft X-rays, is likely to have a transformative impact on science and technology applications requiring laser-like performance at these short wavelengths. Coherent EUV is generated using the high-order harmonic generation (HHG) process driven by a high peak-power ultrafast laser.[1] Applications of HHG light sources include metrology for EUV lithography, spectroscopy, microscopy,[2] and dynamic studies of molecular, [3] magnetic,[4,5] material,[6] and nano systems.[7,8].

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