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Advanced Process Control and Novel Test Methods for PVD Silicon and Elastomeric Silicone Coatings Utilized on Ion Implant Disks, Heatsinks and Selected Platens

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Advanced Process Control and Novel Test Methods for PVD Silicon and Elastomeric Silicone Coatings Utilized on Ion Implant Disks, Heatsinks and Selected Platens

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  • Author: J. Springer, B. Allen, Wriggins, R. Kuzbyt, R. Sinclair
Implanter disks, heatsinks and implant wheels are significant contributors to wafer contamination. This contamination includes particles (wafer front and backside) as well as elemental contamination and also cross contamination. Batch ion implanters with disks or wheels represent the vast majority of high current and high energy systems worldwide. Fabs with analog products and also logic products with geometries unaffected by particle damage or those using slower speed disks or wheels continue to use disks and wheels. Many newer batch implant applications are in areas that were not popular in the period when serial high current systems started to become popular for fine geometries (1,2).

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