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Glossary of Terms for Ion Implantation and Related Processes

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Glossary of Terms for Ion Implantation and Related Processes

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Amorphous is a term applied to a form of silicon that is not crystalline – not structured. Amorphous applies absence of any long-range atomic order. No crystallinity – or totally random. Amorphization occurs when the “damage” caused by high dose implant changes the crystalline structure of a wafer, for example, to a more “amorphous” material on the surface down to about the mean range of the implant ions (that range depends on specie and energy). Some fabs use an “amorphising implant” using Si or Ge ions into silicon wafers as a way of minimizing channeling (q.v.). This amorphizing implant technique is often called “preamorphizing” or preamorphization implant (q.v)

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