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Advances in Optical Densitometry for Low Dose Measurements

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Advances in Optical Densitometry for Low Dose Measurements

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  • Author: Ray Kuzbyt, Ron Eddy, Nicholas R. White, Raymond Callaha
This paper will review the areas where the CorMap (Model 200) offers unique applications for process diagnostics and ion implant monitoring for dose, energy and energy/species. Dose and energy sensitivity over a wide range (inc. 2.5 MeV+) of lower doses will be shown and compared. Implanters manufactured for advanced MOS applications need to have a method for measurement of the dose and uniformity of lower dose implants. A few users may scale up their low dose implants to a dose where sheet resistance can be used but this is undesirable [1].

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