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Using Dissolved Ozone in Semiconductor Cleaning Applications

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Using Dissolved Ozone in Semiconductor Cleaning Applications

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  • Author: Christiane Gottschalk, Juergen Schweckendiek
Ozone (O3), an allotrope of oxygen, is a highly reactive gaseous oxidizing agent that absorbs harmful ultraviolet (UV) radiation, thus enabling life on earth. The first ozone generator was developed by Werner von Siemens in water, to disinfect swimming pools, and to prevent the growth of microorganisms in cooling-tower systems. This article surveys ozone applications in the semiconductor manufacturing industry and provides sample data from users and researchers. Wafer wet cleaning processes will continue to play an important role in semiconductor manufacturing as the complexity of wafer structures increases.

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