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Arc Detection and Mitigation In RF Systems

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Arc Detection and Mitigation In RF Systems

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  • Author: David J. Coumou, El-Riad Choueiry
Radiofrequency (RF) plasma generation and application is a critically important technology that is broadly applied throughout semiconductor device manufacturing. Processes that employ RF excitation include physical vapor deposition (PVD), plasma etch and clean and plasma-enhanced chemical vapor deposition (PECVD). Arc events within a plasma chamber can occur during device manufacturing and such events may damage both the devices under construction and the plasma-based fabrication tools. As well, arc events can initiate undesirable chemistry in the process gas that can produce contaminants that impair device yields. Arcing events are especially a hazard for semiconductor memory device manufacturing processes.

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