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Ozone Applications for Atomic Layer Processing

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Ozone Applications for Atomic Layer Processing

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  • Author: Chris Le Tiec
Atomic layer processes are generally considered selflimiting chemical reactions that occur in monolayers adsorbed on the surface of a substrate. Deposition reactions proceed by creating one monolayer at a time to produce a highly conformal thin film while etch reactions subtract material one monolayer at a time. Controlled deposition or etch in a monolayer-by-monolayer fashion is achieved through sub-nanometer control of the Technological Institute.

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