1.  Home
  2. Whitepapers
  3. Toroidal Remote Plasma Sources for Charge-sensitive On-wafer Applications

Toroidal Remote Plasma Sources for Charge-sensitive On-wafer Applications

Download Whitepaper

Toroidal Remote Plasma Sources for Charge-sensitive On-wafer Applications

Download Whitepaper
This white paper describes the experimental verification of that claim using an industry-standard wafer charging monitor. MKS Paragon® and R*evolution® Remote Plasma Sources were characterized using Ar, N2, O2, and H2 under typical process conditions. Explore the experimental verification of the claim an MKS toroidal remote plasma source delivers primarily neutral radical reactants to a wafer surface, with little to no potentially damaging charged species.

Download Whitepaper Now