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Pulsed Radio Frequency RF Solution for Critical Processes

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Pulsed Radio Frequency RF Solution for Critical Processes

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As the latest ultra-small transistor designs move to non-planar geometries (known as FinFETs) to deliver lower current leakage for higher performance per watt of energy consumed, semiconductor manufacturers face boundary-pushing challenges. Plasmas play a vital role in processing materials during the semiconductor manufacturing process. MKS RF Power products ignite and control the plasma used for etching and deposition of films and layers. The magnitude and frequency of the RF is used to control the electrons, ions and neutrals generating unique chemistries for deposition or a combination of chemistry and energetic particles for etching.

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