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Nitrogen Trifluoride (NF3) Contaminant Detection using MultiGas™ Purity Analyzer

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Nitrogen Trifluoride (NF3) Contaminant Detection using MultiGas™ Purity Analyzer

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High purity bulk NF3 gas is commonly used for chamber clean applications as an alternative to SF6 and other fluozonated gases. The HF and H2 O concentrations are of particular interest, as fluctuations can cause changes in etch rates. Although several purifiers are on the market today to remove water and other contaminants from the high purity NF3 gas, a need exists to monitor the gas from the purifier to ensure that the resulting contamination levels are within the specified range. Gas chromatographs can be used to monitor the impurity levels of the NF3 gas, but this method is not performed in real-time and requires periodic calibration with certified standards.

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