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Nitrous Oxide (N2O) Contaminant Detection Using MultiGas™ Purity Analyzer

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Nitrous Oxide (N2O) Contaminant Detection Using MultiGas™ Purity Analyzer

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High purity bulk N2 O is used as an oxygen source for chemical vapor deposition (CVD) of silicon dioxide layers in semiconductor processing, as well as in LCD production. It has been proven that trace impurities in N2 O have detrimental effects on device performance. To monitor trace impurities in N2 O, methods such as gas chromatography with discharge ionization detection have been used to quantify CO, CO2 , CH4 and H2 O. However, this method is difficult to incorporate into production environments since different columns and oven temperature programs are required to complete the analysis. For polar gas impurities such as NOx and NH3 the chromatography is difficult, thus leading to higher detection limits than desired.

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