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ASTRON® Remote Plasma Source Atomic Fluorine Transport

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ASTRON® Remote Plasma Source Atomic Fluorine Transport

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Remote-plasma cleaning methods are the most appropriate procedures for modern deposition chambers. Most chamber cleaning processes employ atomic fluorine as the most efficient species for chamber cleaning. Proper design for the transport of the atomic fluorine flux from source to the chamber is required to minimize losses due to surface recombination. Moreover, if care is not taken with the materials present within the process chamber, the reactive fluorine will etch these surfaces along with the intended deposition layers, potentially producing high particle counts and component failure within the system.

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