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ASTRON® Remote Plasma Source Integration Best Practices

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ASTRON® Remote Plasma Source Integration Best Practices

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The ASTRON remote plasma source is a low-field, toroidal RF (Radio Frequency) plasma source designed for the remote generation of reactive gas radicals. It is used primarily in CVD chamber cleaning applications where NF3 source gas is dissociated into atomic F which is then used to remove thin films containing Si, W and Ti; it also has applications in processes that require the generation of various radicals such as O, H, N, etc., from a variety of gas sources. This note will describe the best practices for integration of an ASTRON remote plasma source in a CVD process chamber clean application so that it efficiently delivers radicals to the process chamber while meeting all of the system safety requirements.

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