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Vision 2000-a Xd Residual Gas Analyzer For In-situ Ald Process Monitoring

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Vision 2000-a Xd Residual Gas Analyzer For In-situ Ald Process Monitoring

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One solution for the characterization of deposition process chemistries is the use of in-situ monitoring to determine chamber conditions, precursor flux, purge conditions, and the stability and composition of precursor, reactant, and purge gas pulses. Residual Gas Analyzers (RGAs) have been widely applied in CVD and PVD reactor/process development and have potential as a useful in-situ analytical tool for guiding the selection of ALD precursors, the development of ALD process recipes, and the design and qualification of ALD reactors. As well, RGA-based in-situ gas monitoring in fully realized ALD manufacturing processes has the potential to conserve precursor, improve throughput, and yield other process insights that improve the film deposition process.

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