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Optical Gas Analyzers in Modern Semiconductor Manufacturing

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Optical Gas Analyzers in Modern Semiconductor Manufacturing

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This application note describes the MKS TFS analyzer and its benefits and presents several applications in semiconductor chip manufacturing. As the semiconductor technology process node advances into the sub 10nm (nanometer) range, semiconductor device and chip manufacturers require more sophisticated control of semiconductor processes for higher productivity and better chip yield results. One of the challenges chip manufacturers face is controlling the quality and consistency of the wafer film thickness. In order to control the quality of the thin films in situ or in-line, optical gas analyzers can be utilized as an effective solution. This application note discusses MKS’ optical analysis solutions using a TFS™ analyzer, which involves a spectroscopy technique involving tunable filters, for several semiconductor manufacturing applications such as precursor concentration monitoring in a vapor phase delivery system, etch process, endpoint detection, chamber clean endpoint detection, and gas blending control. These solutions are applicable to ALD, CVD, PVD, ALE and MOCVD processes.

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