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Amorphous Silicon Thin Film Solar Cell Scribing

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Amorphous Silicon Thin Film Solar Cell Scribing

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Photovoltaic device technology is a large beneficiary of increasing investment in alternative energy solutions. With manufacturing advantages such as scalability and cross-compatibility with the flat panel display industry, and with considerations for potential scarcity of silicon, the amorphous silicon (a-Si) thin film photovoltaic device (TFPD) is often the technology of choice for high-volume solar cell manufacturers. Diode-pumped solid state (DPSS) lasers have proven their worth in the manufacture of a-Si thin film devices. Q-switched lasers are used for the three principle scribe processes – known as the P1, P2, and P3 scribes – which separate the large planar device into an array of seriesinterconnected photovoltaic cells. The scribe processes involve the removal of various thin film (0.2 – 3.0 μm typical) materials with minimal collateral damage to the glass substrate or other films.

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