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Semiconductor Inspection

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Semiconductor Inspection

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The progression to ever smaller feature sizes on both substrates and mask/reticles produces lower and lower tolerance to defects in both starting materials and finished devices. Not only are we approaching near zero tolerances to known defect types (particles, crystal defects, etc.), but manufacturers continue to discover device sensitivities to entirely new types of defects as manufacturing progresses into the deep nano-scale. In addition, the available metrologies for defect detection are being required to sense and quantify defects at very near the noise level of their operating principles and new approaches to defect detection are continually being developed.

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