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Semiconductor Lithography

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Semiconductor Lithography

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Lithography is defined as "a method of printing from a flat surface (such as a smooth stone or a metal plate) that has been prepared so that the ink will only stick to the design that will be printed". In semiconductor device manufacturing, the stone is the silicon wafer while the ink is the combined effect of the deposition, lithography and etch processes that create the desired feature. Since lithography for device fabrication involves the use of optical exposure to create the pattern, semiconductor lithography is commonly called "photolithography". As with the inspection and metrology techniques already discussed, photolithography is the technique of choice for patterning because it is optical, and thus enables small features and high wafer throughput. This contrasts with other techniques such as direct writing and imprint.

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