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Deep UV Photolithography

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Deep UV Photolithography

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DUV technology for photolithography is exclusively based on projection optics since the pattern on the photomask is much larger than the final pattern developed on the photoresist. The optical system in a 193 nm photolithography tool is known as a catadioptric system. The term means that it uses both lens (refractive) and mirror (reflective) elements for directing and conditioning the light from the laser. Details regarding the operation of such elements can be found in Mirror Physics and Optical Lens Physics. The advantage of this type of system is that it accommodates a broad bandwidth of the source laser light while limiting chromatic aberration. Refractive elements in the optical system are fabricated from either synthetic fused silica or calcium fluoride, materials that have low absorption of 193 nm light. Photomasks (or reticles) in these systems are typically made from fused silica with chrome patterns.

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