https://cdn.gophotonics.com/news/ccc_639035333390925541.webp712370
high-E Photonics, a developer of high-efficiency pulsed laser systems, will present its latest laser platforms at SPIE Photonics West 2026, where the company will exhibit at Booth #2539. The showcase will highlight compact, modular architectures spanning kilohertz-rate ultrafast sources and low-repetition-rate Joule-class lasers engineered for demanding industrial, scientific, fusion, and defence applications.
The company’s ultrafast laser portfolio covers pulse energies from 1 mJ to 100 mJ at kHz-class repetition rates, with femtosecond and picosecond pulse durations across the 1 - 2 µm wavelength range. These systems are designed to support high-throughput micromachining, advanced nonlinear and multiphoton imaging, pump-probe experiments, spectroscopy, and precision processing of glass, crystals, and specialty fibers, as well as nonlinear frequency conversion into the UV, visible, and mid-infrared.
Complementing the ultrafast range, high-E Photonics’ J-Class platforms deliver Joule-level pulse energies from 5 J up to 100 J with nanosecond pulse durations at low repetition rates. Built for high wall-plug efficiency and reduced system complexity, these lasers address applications requiring extreme energy densities, including fusion research, high-energy-density physics, large-area industrial processing, and pump stages for large-scale OPCPA and other high-energy beamlines.
Across both product families, high-E Photonics focuses on robust opto-mechanical design, efficient thermal management, and modern digital control electronics, enabling flexible beam delivery and pulse shaping while simplifying integration into OEM tools and research environments.
